Schedule

Technical Program

The principal chemical processes and mechanisms that enable Area Selective Deposition (ASD) are rapidly becoming critical in several areas of materials and technological advancement. New ASD processes will be needed to enable “chemical alignment” to complement traditional physical alignment (i.e. lithography) and allow transistors to scale to below 10 nm dimensions. Other fields are also exploring chemical selectivity in materials to achieve precise targeted performance. Catalytic materials, for example, which are commonly employed to promote chemically selective reactions, are now being designed and constructed using site-selective deposition reactions. In addition, the growing complexity of energy generation and storage materials are also driving the need for new site- or area-selective processes to control heterogeneous material structures.

To share advances in these areas, the 6th Area Selective Deposition Workshop (ASD 2022), will be held on April 21-22, 2022, at the Westin St. Francis in San Francisco, California USA. The Workshop will bring together leading international scientists and engineers from academia and industry from all regions to share results and insights into: 1) fundamental principles and barriers to area selective deposition; 2) technological needs and challenges as well as new applications of ASD; 3) new chemical approaches and processes to address the expanding needs; and 4) surface characterization techniques and metrology innovation for ASD.

Based on past four successful workshops, ASD 2022 will consist of two days of presentations and discussions. The program will include a series of invited and contributed speakers as well as a poster session reception on the evening of April 7th.

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Keynote Speaker

• Stacey Bent (Stanford University, USA), “Next Generation Nanopatterning Using Area Selective Deposition”

Invited Speakers

• Cathleen Crudden (Queen’s University, Canada), “N-heterocyclic Carbenes in Selective Area Deposition”
• Jolien Dendooven (Ghent University, The Netherlands), “In-situ Studies of Nucleation Mechanisms during ALD of Platinum-Group Metals”
• Damon Farmer (IBM Research, USA), “Inhibitor-Free Nucleation Inhibition of Superconductors”
• Padma Gopalan (University of Wisconsin, USA), “Carbon Nanotube Selective Deposition”
• Andrew Kummel (University of California San Diego), “Pulsed CVD of TiO₂/Al₂O₃ and HfO₂/Al₂O₃ Nanolaminates on Si and SiO₂ in Preference to SiCOH”
• Mikko Ritala (University of Helsinki, Finland), “Area-Selective Etching of Polymers, a Novel Approach to Self-Aligned Patterning of Thin Films”
• Frances Ross (Massachusetts Institute of Technology, USA), “In Situ Electron Microscopy to Visualize Crystal Growth Mechanisms on Plain and Patterned Surfaces”
• Bonggeun Shong (Hongik University, South Korea), “Theoretical Understanding on the Principles of Area-Selective Atomic Layer Deposition”